DB FIB/EDS

 Dual Beam FIB 雙束聚焦離子束

 

 

Single Beam 單束聚焦離子束

 

 

Precision cut for the defectives for different kinds of material.

Sample preparation for TEM, SEM, SSRM and special request.

Mirco-probing system for advantage application. 

 

(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam)  x 10

 

 

FIB(Dual Beam) Capability

Low energy benefits: lithographic resist

 

● At 1 kV, immediate shrinking and distortion

 

●  stable at 500V

 

● Better Material and grain orientation contrast(SEI)

 

● To peruse  higher resolution in low KV MSS has best SEM resolution 0.8nm@2KV

 


工程聯繫窗口

陳小姐  分機6211

E-mail: lynn_chen@msscorps.com