Dual Beam FIB 雙束聚焦離子束



Single Beam 單束聚焦離子束



Precision cut for the defectives for different kinds of material.

Sample preparation for TEM, SEM, SSRM and special request.

Mirco-probing system for advantage application. 


(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam)  x 13



FIB(Dual Beam) Capability

Low energy benefits: lithographic resist


● At 1 kV, immediate shrinking and distortion


●  stable at 500V


● Better Material and grain orientation contrast(SEI)


● To peruse  higher resolution in low KV MSS has best SEM resolution 0.8nm@2KV



陳小姐  分機6211

E-mail: lynn_chen@msscorps.com