Precision cut for the defectives for different kinds of material.
Sample preparation for TEM, SEM, SSRM and special request.
Mirco-probing system for advantage application.
(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam) x 22台
Low energy benefits: lithographic resist
● stable at 500V
● Better Material and grain orientation contrast(SEI)
SEM 陳小姐 分機6211