Precision cut for the defectives for different kinds of material.
Sample preparation for TEM, SEM, SSRM and special request.
Mirco-probing system for advantage application.
(HOT!!) Advanced Equipment (FEI / Helios Dual- Beam)
Low energy benefits: lithographic resist
● stable at 500V
● Better Material and grain orientation contrast(SEI)
FIB 李先生 分機6311
E-mail: fib_xs@msscorps.com